| 发明名称 |
Lithographic processing cell, lithographic apparatus, track and device manufacturing method |
| 摘要 |
A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.
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| 申请公布号 |
US7679715(B2) |
申请公布日期 |
2010.03.16 |
| 申请号 |
US20080213355 |
申请日期 |
2008.06.18 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KRUIJSWIJK STEFAN GEERTE;DE LEEUW RARD WILLEM;LUEHRMANN PAUL FRANK;TEL WIM TJIBBO;VAN WIJNEN PAUL JACQUES;TROOST KARS ZEGER |
| 分类号 |
G03B27/32;H01L21/027;G01R31/26;G03B27/42;G03B27/52;G03D5/00;G03F7/20;G06F19/00 |
主分类号 |
G03B27/32 |
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