发明名称 Dense plasma focus apparatus
摘要 An apparatus for the formation of a dense plasma focus (DPF) has a center electrode formed about an axis, where the center electrode includes a cylindrical part and a tapered part. An outer electrode is formed about the center electrode, and may be either cylindrical, tapered, or formed from a plurality of individual conductors including a helical conductor arrangement surrounding the tapered region of the center conductor. The taper of the center electrode results in an enhanced azimuthal B field in the final region of the device, resulting in increased plasma velocity prior to the dense plasma focus. Using the outer electrode helical structure an auxiliary axial B field is generated during the final acceleration region of the plasma, which reduces axial modal tearing of the plasma in the final acceleration region.
申请公布号 US7679025(B1) 申请公布日期 2010.03.16
申请号 US20050057040 申请日期 2005.02.04
申请人 KRISHNAN MAHADEVAN;THOMPSON JOHN R 发明人 KRISHNAN MAHADEVAN;THOMPSON JOHN R.
分类号 B23K10/00;H05H1/24 主分类号 B23K10/00
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