发明名称 Transistor performance enhancement using engineered strains
摘要 A semiconductor substrate having metal oxide semiconductor (MOS) devices, such as an integrated circuit die, is mechanically coupled to a stress structure to apply a stress that improves the performance of at least a portion of the MOS devices on the die.
申请公布号 US7679145(B2) 申请公布日期 2010.03.16
申请号 US20040930247 申请日期 2004.08.31
申请人 INTEL CORPORATION 发明人 HE JUN;MA ZHIYONG;MAIZ JOSE A.;BOHR MARK;GILES MARTIN D.;XU GUANGHAI
分类号 H01L29/76;H01L23/34;H01L23/495;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
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