发明名称 IMPRINT LITHOGRAPHY.
摘要 A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.
申请公布号 NL2003347(A) 申请公布日期 2010.03.16
申请号 NL20092003347 申请日期 2009.08.12
申请人 ASML NETHERLANDS B.V., 发明人 BOEF, ARIE;JEUNINK, ANDRE;VERMEULEN, JOHANNES;SMITS, PASCAL;WUISTER, SANDER;KRUIJT-STEGEMAN, YVONNE;SCHIFFART, CATHARINUS
分类号 G03F7/00 主分类号 G03F7/00
代理机构 代理人
主权项
地址