发明名称 |
Micromechanical device, micromechanical system, apparatus for adjusting sensitivity of a micromechanical device, method for producing a micromechanical device |
摘要 |
A micromechanical device has a layer; at least a first slot formed in the layer to define a first oscillation element oscillatably suspended via a first spring portion of the layer; and at least a second slot formed in the layer to define a second oscillation element oscillatably suspended via a second spring portion of the layer, wherein a trench is formed in the spring portion pair in a main surface of the layer, wherein a resonance frequency of the first oscillation element is different from that of the second oscillation element, and the first and second spring portions and the trench are formed such that, in an anisotropic lateral material removal and/or addition of the first and second spring portions, a ratio of a relative change of the resonance frequency of the second oscillation element to that of the first oscillation element ranges from 0.8 to 1.2.
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申请公布号 |
US7679152(B2) |
申请公布日期 |
2010.03.16 |
申请号 |
US20080106417 |
申请日期 |
2008.04.21 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANDEWANDTEN FORSCHUNG E.V. |
发明人 |
KLOSE THOMAS;GRAΒHOFF THOMAS |
分类号 |
H01L29/78;G02B26/08;H01L21/00 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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