发明名称 Method of manufacturing semiconductor device
摘要 A method for manufacturing a semiconductor device includes: a step of forming a via plug erected on an electrically conductive layer, and embedding the via plug in an insulation layer to form a wiring structure; and a step of bonding the wiring structure to a wiring substrate including electronic components mounted thereon.
申请公布号 US7678612(B2) 申请公布日期 2010.03.16
申请号 US20070898973 申请日期 2007.09.18
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 FUJII TOMOHARU;OI KIYOSHI
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址