发明名称 |
Semiconductor device with reduced contact resistance |
摘要 |
A semiconductor device that includes an electrode of one material and a conductive material of lower resistivity formed over the electrode and a process for fabricating the semiconductor device.
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申请公布号 |
US7678680(B2) |
申请公布日期 |
2010.03.16 |
申请号 |
US20050144483 |
申请日期 |
2005.06.02 |
申请人 |
INTERNATIONAL RECTIFIER CORPORATION |
发明人 |
FUCHS SVEN;PAVIER MARK |
分类号 |
H01L21/44;H01L21/4763;H01L21/60;H01L23/04;H01L23/10;H01L23/34;H01L23/485 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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