发明名称 System for processing semiconductor substrate by using laser and method of the same
摘要 The present invention provides a system for processing a semiconductor substrate using a laser beam, the system including: a storing unit storing a process control data set for a slot for loading the semiconductor substrate therein; a process controlling unit detecting identification information of the slot in which the semiconductor substrate is loaded, and reading the control data, which is set for the detected identification information, from the storing unit to control a process of the semiconductor substrate; and a substrate processing unit processing the semiconductor substrate on the basis of the read control data using the laser beam with a predetermined energy.
申请公布号 US7680557(B2) 申请公布日期 2010.03.16
申请号 US20070575706 申请日期 2007.03.21
申请人 HANTECH CO., LTD. 发明人 KIM DAE-JIN;RYU JE-KIL;KIM HYUN-JUNG
分类号 G06F19/00 主分类号 G06F19/00
代理机构 代理人
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