发明名称 Semiconductor memory and fabrication method for the same
摘要 A semiconductor memory includes a plurality of active regions; a plurality of bit line contacts disposed on respective active regions; a plurality of first local lines formed in an island shape and in contact with upper surfaces of the plurality of bit line contacts; a plurality of first via contacts in contact with the upper surfaces of the plurality of first local lines and aligned in a direction parallel to the active regions; a first bit line in contact with one of the plurality of first via contacts and extending in a direction parallel to the active regions; and a plurality of second via contacts arranged above the first via contacts that are not in contact with the first bit line through respective second local lines.
申请公布号 US7679108(B2) 申请公布日期 2010.03.16
申请号 US20060339483 申请日期 2006.01.26
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MATSUNAGA YASUHIKO;ARAI FUMITAKA;SAKUMA MAKOTO
分类号 H01L27/10 主分类号 H01L27/10
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