| 发明名称 |
Method of manufacturing high sensitivity spin valve designs with ion beam treatment |
| 摘要 |
A method of manufacturing a GMR, TMR or CPP GMR sensor having a smooth interface between magnetic and non-magnetic layers to improve sensor performance by exposing a layer to a low energy ion beam prior to depositing a subsequent layer.
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| 申请公布号 |
US7676904(B2) |
申请公布日期 |
2010.03.16 |
| 申请号 |
US20040903097 |
申请日期 |
2004.07.30 |
| 申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. |
发明人 |
CHAU PHONG V.;FREITAG JAMES MAC;PINARBASI MUSTAFA MICHAEL;ZENG HUA AI |
| 分类号 |
G11B5/127;C23C14/34 |
主分类号 |
G11B5/127 |
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