DOUBLE PATTERNING PROCESS

摘要

PURPOSE: A double patterning process is provided to conveniently process minute patterns by enabling double patterning and to process minute patterns through immersion exposure. CONSTITUTION: A double patterning process comprises the steps of: forming a resist film by applying a first positive type resist material on a substrate to be processed; irradiating high energy beam on a resist film, heating and developing the film after exposure to obtain a first positive type pattern; heating the first positive type pattern and irradiating high energy beam to the first positive type pattern; insolublizing the film in a solvent of a second resist material and in alkaline development when patterning the second resist material; and applying the second resist material on the first resist pattern; and irradiating high energy beam to the second resist film to obtain a second resist pattern.