| 摘要 |
PURPOSE: A magnetron sputtering source, a sputter-coating system, and a substrate coating method are provided to ensure uniform layer distribution in a bent substrate using a bent cathode. CONSTITUTION: A magnetron sputtering source for a sputter-coating system comprises at least one target(4), a coating plasma generating unit, and at least one magnet array. The target offers one of coating and treatment materials. The magnet array creates a magnetic field affecting coating plasma so that one or more plasma channels(8,8',8") are formed on a partial surface of the target.
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