发明名称 SUBSTRATE PLACING MECHANISM, SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD OF SUBSTRATE PLACING MECHANISM AND RECORDING MEDIUM
摘要 <p>PURPOSE: A substrate table mechanism apparatus, a substrate processing apparatus, and a control method and storage media of a substrate table mechanism apparatus are provided so that a substrate processing apparatus equipped with the substrate table mechanism apparatus, and this substrate table mechanism apparatus, and the control method and the computer-readable storage medium executing this control method in computer of the substrate table mechanism apparatus can be offered. CONSTITUTION: A substrate table mechanism apparatus, a substrate processing apparatus, and a control method and storage media of a substrate table mechanism apparatus comprises a main chuck(4), a first lifter(8a), and a second lifter(8b). The main chuck is equipped with a substrate. The external periphery portion of the processed substrate is supported. A second lifter supports a center area of a processed substrate than a location in which a first lifter supports the processed substrate.</p>
申请公布号 KR20100029042(A) 申请公布日期 2010.03.15
申请号 KR20090082972 申请日期 2009.09.03
申请人 TOKYO ELECTRON LIMITED 发明人 SAEGUSA NAOYA;SHIMURA AKIHIKO
分类号 H01L21/68;B25J13/00;H01L21/677 主分类号 H01L21/68
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