SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to prevent the heat loss of a substrate mounting unit by arranging an insulating member between the substrate mounting unit and an induction heat unit. CONSTITUTION: A substrate processing apparatus comprises a chamber(100), a substrate mounting unit(200), an induction heat unit(300), and at least one insulating member(400). The chamber comprises a reaction space. The substrate(10) is mounted in the substrate mounting unit in the chamber. The induction heat unit heats the substrate mounting unit. The insulating member is interposed between the induction heat unit and the substrate mounting unit.