发明名称 METHOD FOR PREPARING METAL DOPED TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND THIN FILM TRANSISTOR USING THE SAME
摘要 <p>PURPOSE: A method for manufacturing a metal-doped transparent conductive oxide thin film and a thin film transistor using the same are provided to drive the thin film transistor at a low voltage by adjusting the resistance distribution of the transparent conductive oxide thin film. CONSTITUTION: Metal and oxide are simultaneously deposited on a substrate. An oxide film is formed. The metal is doped into the oxide layer. The metal is selected from a group including Mo, Ti, Cu, Sr, Ge, Mg, Y, Zr, B, V, Ta, Tl, Ir, Te, Sb, Cr, Fe, Co, Ru, Ag, Au, Pt, Me, Ni, Sn, Bi, Al, Ga and In. The oxide is selected from a group including ZnO, SnO2, Zn-Sn-O, Ga2O3 and In2O3.</p>
申请公布号 KR20100028347(A) 申请公布日期 2010.03.12
申请号 KR20080087342 申请日期 2008.09.04
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 CHEONG, WOO SEOK;RYU, MIN KI;CHUNG, SUNG MOOK;HWANG, CHI SUN;CHU, HYE YONG
分类号 H01L21/20;H01L21/265;H01L29/786 主分类号 H01L21/20
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