| 发明名称 |
A LASER-RESISTANT MASK AND THE FABRICATION METHOD THEREOF |
| 摘要 |
<p>PURPOSE: A laser-resistant mask and a fabrication method thereof are provided to improve precision by efficiently patterning a plurality of reflective films having the different etch rate. CONSTITUTION: A laser reflective type mask comprises a base substrate(200), a reflective film pattern(220b). The base substrate comprises a reflective film filling groove(202) in a reflective region of the laser beam. The reflective film pattern is buried in the reflective film filling groove. The reflective film pattern is formed by laminating a first and a second reflective pattern alternately. The second reflective film has a reflectivity higher than that of the first reflective film.</p> |
| 申请公布号 |
KR100947550(B1) |
申请公布日期 |
2010.03.12 |
| 申请号 |
KR20090082641 |
申请日期 |
2009.09.02 |
| 申请人 |
WI-A CORPORATION |
发明人 |
YOON, HYEONG RYEOL;PARK, NAE HWANG;KIM, SU CHAN;LEE, CHAN KOO;KIM, YONG MUN |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
| 代理机构 |
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