| 摘要 |
<p>PURPOSE: A photosensitive polymer for a photoresist, a manufacturing method thereof, and a photoresist composition comprising the same are provided to be used in a lithographic process using a DUV excimer-laser source due to excellent etching resistance and adhesion with an underlayer. CONSTITUTION: A photosensitive polymer for a photoresist comprises a structure of chemical formula 1. In chemical formula 1, R1 and R2 are C1 ~ 10 alkyl group; R3 is a methyl group, ethyl group or isopropyl group; x, y and z are 1 ~ 60 mole % as mole % of each repeating unit. The photosensitive composition comprises the photosensitive polymer, photoacid generator, and organic solvent.</p> |
