发明名称 FILM FORMATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: An apparatus and a method for forming a film, a substrate process apparatus and a computer-readable storage media are provided to detect the rotation position of a rotatable table using a position detection unit. CONSTITUTION: An apparatus for forming a film includes a rotatable table(2), a first reaction gas supply unit, a second reaction gas supply unit, a fist separation gas supply unit, a position detection unit and an area to be detected(25). A substrate is loaded on the rotatable table. The rotation position of the rotatable table is detected by the position detection unit. The area to be detected is arranged on the peripheral of the rotatable table and is detected by the position detection unit.
申请公布号 KR20100028492(A) 申请公布日期 2010.03.12
申请号 KR20090082743 申请日期 2009.09.03
申请人 TOKYO ELECTRON LIMITED 发明人 KATO HITOSHI;HONMA MANABU;HANEISHI TOMOKI
分类号 H01L21/20 主分类号 H01L21/20
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