发明名称 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To suppress heat effects of a vacuum pump on a structure without lowering the efficiency of exhaust of the vacuum pump. <P>SOLUTION: The exposure system has: a vacuum chamber for accommodating the structure; the vacuum pump for increasing a degree of vacuum inside the vacuum chamber; a radiation member for performing heat exchange by radiation with respect to the structure; a temperature detecting means for detecting a temperature of the structure; and a control means for controlling a radiation means based on the detection temperature of the temperature detecting means. The radiation means is arranged at a position which does not block heat exchange by radiation between the vacuum pump and the structure. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010056233(A) 申请公布日期 2010.03.11
申请号 JP20080218457 申请日期 2008.08.27
申请人 CANON INC 发明人 NANBA HISASHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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