发明名称 |
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS |
摘要 |
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.
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申请公布号 |
US2010062374(A1) |
申请公布日期 |
2010.03.11 |
申请号 |
US20090553441 |
申请日期 |
2009.09.03 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
NISHI TSUNEHIRO;KINSHO TAKESHI;OHASHI MASAKI;HASEGAWA KOJI;IIO MASASHI |
分类号 |
G03F7/004;C07C69/52;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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