| 摘要 |
This document discloses semiconductor processing systems, methods, and devices. The systems, methods and devices activate dopants in a processing chamber having a temperature that is less than, for example, 300 degrees. A microwave energy source provides a microwave transmission to a waveguide system that uniformly distributes the microwave transmission. The waveguide system can include a rectangular waveguide coupled to a cylindrical waveguide. The rectangular waveguide guides the microwave transmission in a second propagation direction to a cylindrical waveguide. The cylindrical waveguide uniformly distributes the electromagnetic transmission and guides the electromagnetic transmission in a third propagation direction to a processing chamber. A semiconductor wafer can be exposed to the microwave transmission and the temperature of the chamber to activate dopants in the semiconductor wafer.
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