发明名称 SEMICONDUCTOR MULTILAYER STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor multilayer structure which has a GaN layer as a surface layer and hardly causing cracks due to thermal expansion. <P>SOLUTION: The semiconductor multilayer structure includes a ZnO substrate 10 and a group III-V nitride epitaxial layer 11 which is directly formed on the substrate 10 by epitaxial growth. The group III-V nitride epitaxial layer 11 includes from a first layer 12 to an n-th layer 14 having different compositions, wherein n is an integer of &ge;3 and the n-th layer 14 is substantially composed of GaN. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010053002(A) 申请公布日期 2010.03.11
申请号 JP20080222151 申请日期 2008.08.29
申请人 KANAGAWA ACAD OF SCI & TECHNOL;UNIV OF TOKYO;MITSUBISHI CHEMICALS CORP 发明人 FUJIOKA HIROSHI;KOBAYASHI ATSUSHI;HORIE HIDEYOSHI;AMAUCHI HIDETAKA;NAGAO SATORU
分类号 C30B29/38;C23C14/06;H01L21/203;H01L33/32;H01S5/323 主分类号 C30B29/38
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