发明名称 |
SEMICONDUCTOR MULTILAYER STRUCTURE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor multilayer structure which has a GaN layer as a surface layer and hardly causing cracks due to thermal expansion. <P>SOLUTION: The semiconductor multilayer structure includes a ZnO substrate 10 and a group III-V nitride epitaxial layer 11 which is directly formed on the substrate 10 by epitaxial growth. The group III-V nitride epitaxial layer 11 includes from a first layer 12 to an n-th layer 14 having different compositions, wherein n is an integer of ≥3 and the n-th layer 14 is substantially composed of GaN. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010053002(A) |
申请公布日期 |
2010.03.11 |
申请号 |
JP20080222151 |
申请日期 |
2008.08.29 |
申请人 |
KANAGAWA ACAD OF SCI & TECHNOL;UNIV OF TOKYO;MITSUBISHI CHEMICALS CORP |
发明人 |
FUJIOKA HIROSHI;KOBAYASHI ATSUSHI;HORIE HIDEYOSHI;AMAUCHI HIDETAKA;NAGAO SATORU |
分类号 |
C30B29/38;C23C14/06;H01L21/203;H01L33/32;H01S5/323 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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