A SUBSTRATE, A METHOD OF MEASURING A PROPERTY, AN INSPECTION APPARATUS AND A LITHOGRAPHIC APPARATUS
摘要
Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
申请公布号
WO2010025793(A1)
申请公布日期
2010.03.11
申请号
WO2009EP05419
申请日期
2009.07.27
申请人
ASML NETHERLANDS B.V.;VAN DE KERKHOF, MARCUS, ADRIANUS;VAN DER SCHAAR, MAURITS;SMILDE, HENDRIK, JAN, HIDDE
发明人
VAN DE KERKHOF, MARCUS, ADRIANUS;VAN DER SCHAAR, MAURITS;SMILDE, HENDRIK, JAN, HIDDE