| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition involving little bubbles even when applied to a substrate with level difference, and a fall in film thickness due to trailing at a stepped part while holding general characteristics required of a photosensitive resist. <P>SOLUTION: The photosensitive resin composition contains (A) resin containing a carboxyl group and/or a vinyl group, (B) a photopolymerization initiator having an oxime ester skeleton, (C) a photosensitizer having maximum absorption wavelength in 370-420 nm, and (D) a photo-crosslinking monomer. <P>COPYRIGHT: (C)2010,JPO&INPIT |
