| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mold manufacturing method for manufacturing a precise replica mold using an electroforming method by carrying out washing without damaging a mold formed with a fine structure in a nanoimprinting method which is a pattern transfer technology for forming a fine-shaped structure. Ž<P>SOLUTION: The method of manufacturing a master mold for nanoimprint comprises forming a pattern on a resist-applied silicon substrate by electron beam drawing to prepare a silicon master, separating a master mold having a rugged pattern reverse to a resist pattern of the silicon master formed by electroforming, from the silicon master, and then eliminating resist residue on the surface of the master mold by irradiation of plasma containing atomic hydrogen. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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