| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ink composition for inkjet, which provides cured products excellent in close adhesion with metal plates, resistance to etching liquid, and alkali release properties, and which is stably discharged with inkjet. <P>SOLUTION: The inkjet ink composition for an etching resist includes a polymerizable monomer polymerizable by active energy beams. The polymerizable monomer contains, in all the monomers, 1-30 mass% of a polymerizable ester compound represented by general formula (I): CH<SB>2</SB>=C(-R)-COO-Y-OCO-X-COOH, 10-75 mass% of a polyfunctional monomer having in the molecule two or more ethylenic double bond groups and no phosphate group, the amount of the ethylenic double bond groups being 4×10<SP>-3</SP>to 8×10<SP>-3</SP>mol/g, and 10-75 mass% of a monofunctional monomer having in the molecule an ethylenic double bond group and no phosphate group and no carboxy group. The viscosity of the ink composition is 3-50 mPa s at 25°C. <P>COPYRIGHT: (C)2010,JPO&INPIT |
