发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which employs a non-metallic furnace throat part thereby preventing metallic pollution of a substrate during substrate processing operation, and which has long life by suppressing the temperature rise of an O-ring provided on a seal part thereby preventing degradation or burnout of the O-ring. Ž<P>SOLUTION: The substrate processing apparatus includes a reaction tube for processing the substrate therein, a heating device for heating the reaction tube, a manifold 22 provided continuously to the reaction tube and constituted of a non-metallic material, a lid for covering the manifold 22, and a sealing member provided between the manifold 22 and the lid. A gas feed section is arranged in the manifold 22 from an outer wall in the direction orthogonal to the axis of the reaction tube to an inner wall. A hollow part 71 is formed between the heating device and the sealing member, and a metallic member is arranged in the hollow part 71. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010053393(A) 申请公布日期 2010.03.11
申请号 JP20080218845 申请日期 2008.08.27
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 NISHIDO SHUHEI;TANAKA AKINORI;SATO AKIHIRO
分类号 C23C16/44;H01L21/205;H01L21/22;H01L21/31 主分类号 C23C16/44
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