WET ETCHING APPARATUS

摘要

PURPOSE: A wet etching apparatus is provided to stably transfer a substrate without the deformation of the substrate by supporting the substrate with a roller of a substrate guide unit which guides the both side of the substrate. CONSTITUTION: An etching chamber(110) performs an etching operation. A transfer unit transfers a substrate(G) lengthways. A jetting unit(130) jets an etching solution on the substrate which is transferred into the etching chamber by the transfer unit. A substrate guide unit(140) guides the transference of the substrate. The substrate guide unit includes a plurality pairs of rollers(141). The rollers are spaced apart from each other and rotate under the condition of contacting the both side of the substrate.