| 发明名称 |
GAS SUPPLY MEMBER AND PLASMA PROCESSING DEVICE |
| 摘要 |
<p>A gas supply member (11) includes an annular section (12) having an annularly extending gas flow path provided inside the annular section. The annular section (12) is provided with an annular first member (13a) including a flat plate section (18) having gas supply holes (19) formed in the flat plate section, and also with an annular second member (13b) for forming a space (14), which is the gas flow path, between the second member (13b) and the first member (13a).</p> |
| 申请公布号 |
WO2010026879(A1) |
申请公布日期 |
2010.03.11 |
| 申请号 |
WO2009JP64521 |
申请日期 |
2009.08.19 |
| 申请人 |
TOKYO ELECTRON LIMITED;SUDOU, KENJI;MIHARA, NAOKI |
发明人 |
SUDOU, KENJI;MIHARA, NAOKI |
| 分类号 |
H01L21/3065;C23C16/455;H01L21/205 |
主分类号 |
H01L21/3065 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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