发明名称 SUBSTRATE PROCESSING UNIT AND SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technique for improving nozzle operation rate while avoiding collision between nozzles. SOLUTION: A control section moves a development nozzle 21 between development processing sets 10 by moving the development nozzle 21 on a horizontal plane (moving travelling plane H1) at a first height (AR2, AR6). Meanwhile, the moving travelling plane H1 is formed above a movement area of a pure water nozzle 130 (area where the pure water nozzle 130 moves in moving the pure water nozzle 130 between a processing position S130 and a retreating position T130). Accordingly, it is possible to freely move the development nozzle 21 between the development processing sets 10 without considering the interference with the pure water nozzle 130, and thus, the operation rate of the development nozzle 21 and the pure water nozzle 130 is improved. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010056318(A) 申请公布日期 2010.03.11
申请号 JP20080220088 申请日期 2008.08.28
申请人 SOKUDO CO LTD 发明人 SHIGA MASAYOSHI;YOSHII HIROYUKI;SUGIYAMA NEN
分类号 H01L21/304;G02F1/13;H01L21/027;H01L21/306 主分类号 H01L21/304
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