发明名称 VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which can form a layer on an appropriate part. SOLUTION: The vapor deposition apparatus 1 is directed for forming a reflection layer on a screen 7 by vapor deposition. In a light incidence side of the screen 7, horizontal faces and inclined faces which intersect each other at a predetermined angle are alternately formed along a predetermined direction. The vapor deposition apparatus 1 has a cooling roll 33 for supporting the screen 7, and a crucible 4 which is arranged so as to face to the inclined faces and forms the reflection layer on the horizontal faces by vaporizing a vapor deposition material. The screen 7 is supported by the cooling roll 33 along a vertical direction. The horizontal faces are formed so as to direct a head side in the vertical direction and are formed alternately with the inclined faces along the vertical direction. The crucible 4 is arranged in the head side in the vertical direction of the screen 7 which is supported by the cooling roll 33. Thereby, the vapor deposition apparatus can deposit the vapor deposition material only on the inclined faces of the screen 7, and can form the reflection layer only on the inclined faces. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010053373(A) 申请公布日期 2010.03.11
申请号 JP20080216838 申请日期 2008.08.26
申请人 SEIKO EPSON CORP 发明人 KITABAYASHI MASASHI
分类号 C23C14/24;G03B21/60 主分类号 C23C14/24
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