发明名称 CLEANING APPARATUS AND CLEANING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus for removing foreign matters existing between fine roughness on an insulator surface, coated on the metal surface of a vacuum processing apparatus. Ž<P>SOLUTION: The cleaning apparatus includes an adhesive sheet 5 provided with a base 51 and an adhesive surface 52, a conductive sheet 7 in contact with the base 51, and a pressing member 11 for pressing the conductive sheet 7 to the adhesive sheet 5, and a voltage application mechanism 9 for applying a positive or negative voltage to the conductive sheet 7 and a pressing force adjusting mechanism 8 for pressing the adhesive sheet 5 to the curved surface 10 of the vacuum processing apparatus. The pressing member 11 presses the conductive sheet 7 and the adhesive sheet 5, by a pressing force adjusted in the pressing force adjusting mechanism 8, so that the foreign matters stuck to an insulator 10 are removed by the closely stuck adhesive surface 52 of the adhesive sheet 5 and the curved surface of the insulator 10, and the foreign matters stuck to the insulator 10 are absorbed and removed by an electrostatic suction force, generated by applying a positive or negative voltage to the conductive sheet 7. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010056113(A) 申请公布日期 2010.03.11
申请号 JP20080216343 申请日期 2008.08.26
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IKENAGA KAZUYUKI;TETSUKA TSUTOMU;FURUSE MUNEO
分类号 H01L21/3065;C23C16/44 主分类号 H01L21/3065
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