发明名称 METHOD AND DEVICE FOR CLEANING SUBSTRATE, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To clean a substrate, while preventing a protruding part of a pattern from toppling due to the surface tension of a cleaning liquid, in removing or drying the cleaning liquid in cleaning the substrate having a formed pattern on the surface thereof by the cleaning liquid. SOLUTION: The cleaning liquid is supplied to the substrate to clean the substrate, while the substrate is heated so that the Leidenfrost phenomenon may occur, because of the vapor of a liquid drop intervening between the substrate to be cleaned and the liquid drop of the cleaning liquid. The vapor of the cleaning liquid sprays out downward, from the lower surface of the drop of the cleaning liquid supplied to the substrate so that the surface tension between the substrate and the liquid drop is eliminated or decreased, to be extremely small, and the residues, or the like on the substrate, are lifted upward and are taken into the liquid drop by the vapor. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010056534(A) 申请公布日期 2010.03.11
申请号 JP20090173600 申请日期 2009.07.24
申请人 TOKYO ELECTRON LTD 发明人 TAMURA AKITAKE;KAKIMOTO AKINAGA;DOBASHI KAZUYA
分类号 H01L21/304 主分类号 H01L21/304
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