| 发明名称 |
TOP PANEL AND PLASMA PROCESSING APPARATUS USING THE SAME |
| 摘要 |
<p>A top panel is integrally arranged with an opening section on a ceiling of a processing container of a plasma processing apparatus whose inside can be brought into vacuum state. The top panel is provided with a plurality of gas channels formed along a planar direction of the top panel, and a gas jetting port, which communicates with the gas channels and is opened on a top panel first surface facing inside the processing container.</p> |
| 申请公布号 |
KR20100028106(A) |
申请公布日期 |
2010.03.11 |
| 申请号 |
KR20107000848 |
申请日期 |
2008.08.21 |
| 申请人 |
TOKYO ELECTRON LIMITED;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY |
发明人 |
ISHIBASHI KIYOTAKA;OHMI TADAHIRO;GOTO TETSUYA;OKESAKU MASAHIRO |
| 分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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