发明名称 GAS TREATMENT APPARATUS, GAS TREATMENT METHOD, AND STORAGE MEDIUM
摘要 PURPOSE: A gas treatment apparatus, a gas treatment method, and storage media are provided to reduce the usage of liquid material using a vaporized liquid raw material as a treatment gas. CONSTITUTION: A storage container for a raw material(20) is hermetically sealed by a vacuum-exhaust. A liquid raw material is vaporized by vacuum pressure. The storage container is filled with the vaporized liquid raw material. The chamber(2) is hermetically sealed by the vacuum-exhaust. The vaporized liquid raw material flows into the chamber. The pressure in the chamber is higher than the vacuum pressure and lower than the vapor pressure of the vaporized liquid raw material.
申请公布号 KR20100027965(A) 申请公布日期 2010.03.11
申请号 KR20090077629 申请日期 2009.08.21
申请人 TOKYO ELECTRON LIMITED 发明人 MURATA AKIRA
分类号 H01L21/205 主分类号 H01L21/205
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