Atomic Layer Deposition Device,申请号KR20070085755-传众专利搜索

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发明名称	Atomic Layer Deposition Device
摘要
申请公布号	KR100946159(B1)	申请公布日期	2010.03.11
申请号	KR20070085755	申请日期	2007.08.24
申请人		发明人
分类号	C23C16/455;C23C16/00	主分类号	C23C16/455
代理机构		代理人
主权项
地址

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