| 摘要 |
<p>PURPOSE: A rotating disc chuck stage apparatus and an alignment method using the same are provided to improve the throughput of a lithograph process by separately and simultaneously performing an alignment process and a leveling process in separate stages. CONSTITUTION: A rotating stage(100) connects a plurality of stages(110 to 160) on which a wafer is loaded around one rotary shaft(170). A rotation control part(200) controls the rotation of the stages by rotating the rotary shaft. An alignment/leveling control part(300) controls each stage of an alignment process and a leveling process. Each stage includes a disk chuck for supporting a loaded wafer and a tool-induced shift(TIS) mark for a TIS alignment.</p> |
