| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for detecting a silicon substrate dislocated from a carrier on a polishing cloth even if the polishing cloth used for polishing the substrate is black. Ž<P>SOLUTION: A predetermined position S<SB>1</SB>on the polishing cloth 11 is irradiated with first inspection light from a first reflection sensor A apparatus at an angle of 15° from the upper face side of the polishing pad. A first light receiving element signal P<SB>1</SB>of the quantity of reflected light is compared with a threshold L<SB>w</SB>, and an on/off signal is transmitted from a first relay A. At the same time, the predetermined position S<SB>1</SB>on the polishing cloth 11 is irradiated with second inspection light from a second reflection sensor B apparatus at an angle of 5° from the upper face side of the polishing pad. A second light quantity signal P<SB>2</SB>of the quantity of reflected light is compared with a threshold L<SB>b</SB>, and an on/off signal is transmitted from a second relay B. When the combination of the on/off signals transmitted from the respective relays A, B is the same (on and on), an "on" alarm signal meaning the occurrence of dislocation of the substrate on the polishing pad is output to a sequence of an index head type polishing device 30. Ž<P>COPYRIGHT: (C)2006,JPO&NCIPI Ž</p> |
