发明名称 METHOD FOR FABRICATING CAPACITOR
摘要 PURPOSE: A method for manufacturing a capacitor is provided to prevent a bottom electrode from permeating between a support layer and a sacrificial layer by filling a protective layer in a weak interface between a support layer and a sacrificial layer. CONSTITUTION: A first sacrificial layer(15A), a support layer(16), a second sacrificial layer(15B) are laminated on a substrate(11). An opening unit is formed by selectively forming the first and second sacrificial layers and the support layer. The protective layer(19) is formed on the weak interface between the first and second sacrificial layers and the support layer. The lower electrode is formed along the step of the opening unit. The first and second sacrificial layers and the protective layer are removed.
申请公布号 KR20100026197(A) 申请公布日期 2010.03.10
申请号 KR20080085107 申请日期 2008.08.29
申请人 HYNIX SEMICONDUCTOR INC. 发明人 OH, SEUNG SUK
分类号 H01L27/108 主分类号 H01L27/108
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