MICRO CANTILEVER AND METHOD OF MANUFACTURING THE SAME AND SILICON THIN FILM AND METHOD OF MANUFACTURING THE SAME

摘要

PURPOSE: A micro cantilever, a silicon thin film, and a manufacturing method thereof are provided to control the low thermal budget of a stress gradient by using a built-up stress generated from a Cu-silicide process. CONSTITUTION: A substrate(10) is prepared. A sacrificial layer is evaporated on the top of the substrate. The sacrificial layer is etched in order to eliminate a part of the sacrificial layer. A cantilever structure layer(20) is evaporated on the exposed substrate part and the sacrificial layer by removing a part of the sacrificial layer. A Cu- thin film(30) is evaporated on the cantilever structure layer. A Cu-silicide(40) is formed on the cantilever structure layer by a furnace annealing in the Cu-thin film. The furnace anneal temperature is 200 °C or less.