SPUTTERING TARGET, TRANSPARENT CONDUCTIVE FILM, AND THEIR MANUFACTURING METHOD

摘要

A sputtering target composed of indium oxide and zinc oxide. The content of zinc atoms ranges from 3 to 20 atom% based on the total of indium atoms and zinc atoms. The maximum particle diameter of the crystals in the sputtering target is 5μm ore less. Few nodules are produced on the surface of the target while a transparent conductive film is formed by sputtering, and therefore the sputtering is conducted stably.