发明名称 |
FERROELECTRIC RANDOM ACCESS MEMORY FAIL BIT SCREENING METHOD AND THE MEMORY DEVICE |
摘要 |
PURPOSE: A ferroelectric random access memory device is provided to secure a sensing margin by differently generating voltages which is applied to a reference cell and a memory cell. CONSTITUTION: A reference cell(310) is composed of a ferroelectric random access capacitor and transistor. A memory cell(320) is composed of a ferroelectric random access capacitor and transistor. A DC generator is formed in the reference cell and generates a large range of a driving voltage. The capacitor of the reference cell and the capacitor of the memory cell occupy the identical size of area. The memory cell includes the DC generator. |
申请公布号 |
KR20100025897(A) |
申请公布日期 |
2010.03.10 |
申请号 |
KR20080084647 |
申请日期 |
2008.08.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, HYUN HO |
分类号 |
G11C11/22;G11C29/00 |
主分类号 |
G11C11/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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