| 摘要 |
<p>PURPOSE: An activated gas injector, a film formation apparatus and a film formation method are provided to form a stacked thin film by performing several cycles for supplying different reactive gases on the surface of a substrate. CONSTITUTION: A flow passage defining unit is divided into a gas activation passage and a gas introduction passage by a partition wall. A gas introduction part introduces a process gas to the gas introduction passage. A pair of electrodes(36a, 36b) are installed in the gas activation passage along the partition wall. A through hole(341) supplies the process gas in the gas introduction passage to the gas activation passage. A gas ejection hole(33) is installed in the gas activation passage and ejects the activated gas.</p> |
