| 摘要 |
The invention relates to means of SHF methods for determination of q-quality of dielectric materials. Method for determination of q-quality of dielectric materials is in fact that SHF radiation is applied to input of polarization interferometer that is symmetrical rectangular branch pf waveguides with two close-periodic wire grids installed in diagonal plane, and two two-facet rectangular angular reflectors installed in neighboring arms of the branch, SHF radiation passes through wave guide of interferometer with splitting by second close-periodic wire grid to orthogonal-polarization component waves at outputs of interferometer by which ohe finds conditions of resonance and calculates respective working frequencies of interferometer with material under investigation and q-quality of dielectric material. dielectric material is placed in polarization interferometer after the first close-periodic wire grid, at that at frequency of measurement one sets lengths of wave guides in neighboring arms of the branch that are equal to integer number of half-waves, with provision of condition of resonance at absence of dielectric material and at presence of dielectric material, one performs measurements of first and second level of SHF power in output arms of interferometer, by those one calculates q-quality of dielectric material. The invention provides decrease of error of measurement and decrease of time for measuring. |
