| 摘要 |
PURPOSE: An apparatus for light-induced chemical vapor deposition is provided to improve the reliability of an electron device by deposition a superior quality of thin film on a substrate at a wide process window. CONSTITUTION: A substrate(260) is placed on a substrate support stand(270). A reaction chamber(280) provides a reaction space. A reaction gas supply unit(230) supplies a reaction gas to the reaction space. A light source unit(210) generates a light. A light radiation unit excites and decomposes the reaction gas by the light.
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