发明名称 Deposition from liquid sources
摘要 A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected to a source of silicon precursor, which preferably comprises liquid trisilane in a mixture with one or more dopant precursors. The mixture is metered as a liquid and delivered to the injector, where it is then vaporized and injected into the process chamber.
申请公布号 US7674728(B2) 申请公布日期 2010.03.09
申请号 US20070693556 申请日期 2007.03.29
申请人 ASM AMERICA, INC. 发明人 TODD MICHAEL A;RAAIJMAKERS IVO
分类号 H01L21/469 主分类号 H01L21/469
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