| 摘要 |
PURPOSE: A nano structure and a fabrication method thereof are provided to fabricate the nano structure with a desired size and shape with a low cost and a high throughput. CONSTITUTION: A fabrication method of a nano structure comprises the following steps: supplying an on-insulator(SOI) substrate including a silicon wafer(110), a first oxide layer(120) and a silicon layer(130); arranging a polysilicon pattern on the SOI substrate; arranging a second oxide layer on the polysilicon pattern and the SOI substrate; partially removing the second oxide layer to form a side wall structure close to the polysilicon pattern; removing the polysilicon pattern; transferring a side wall structured oxide spacer pattern to the silicon layer on the SOI substrate to form the nano structure; and partially removing the first oxide layer to release the nano structure.
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