发明名称 SYSTEM FOR ISOLATING AN EXPOSURE APPARATUS
摘要 A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382). With this design, the components of the precision fabrication apparatus (12) are better protected by the suspension system (16) during a seismic disturbance. This reduces the likelihood of damage and misalignment of the components of the precision fabrication apparatus (12) during the seismic disturbance.
申请公布号 US2010053589(A1) 申请公布日期 2010.03.04
申请号 US20090548895 申请日期 2009.08.27
申请人 HASHEMI FARDAD A;WATSON DOUGLAS C;MARGESON CHRISTOPHER 发明人 HASHEMI FARDAD A.;WATSON DOUGLAS C.;MARGESON CHRISTOPHER
分类号 G03F7/20;B23P11/00;F16M13/00 主分类号 G03F7/20
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