摘要 |
<p>A method for manufacturing a boron doped, transparent, conductive zinc oxide layer from on a substrate is disclosed. The layer is being deposited from at least diethylzinc, water and diborane by low pressure chemical vapour deposition (LPCVD) in a process chamber of a deposition system comprising wherein the gas flow ratio of diethylzinc and water is kept between 0.87 and 1.3 and the gas flow ratio of diborane and diethylzinc is being kept between 0.05 and 0.4. The haze of such manufactured layer, measured as ratio of diffuse transmittance to total transmittance at 600nm, is between 10 and 25%.</p> |
申请人 |
BORRELLO, DANIEL;BENAGLI, STEFANO;MEIER, JOHANNES;KROLL, ULRICH;VALLAT-SAUVAIN, EVELYNE;OERLIKON SOLAR IP AG, TRUEBBACH;DIMITRY, ZIMIN;ZINDEL, ARNO;TEREN, ANDREW;WATKINS, OWAN CHARLES;DESPONT, LAURENT;WIDER, JOACHIM;RAMOINO, LUCA;GOSSLA, MARIO;VOGLER, BENJAMIN;KERSCHBAUMER, JOERG;SCHNEIDER, STEFAN;MARK, ANDREAS;POPPELLER, MARKUS;KUHN, HANSJOERG |
发明人 |
DIMITRY, ZIMIN;ZINDEL, ARNO;TEREN, ANDREW;WATKINS, OWAN CHARLES;DESPONT, LAURENT;WIDER, JOACHIM;RAMOINO, LUCA;GOSSLA, MARIO;VOGLER, BENJAMIN;KERSCHBAUMER, JOERG;SCHNEIDER, STEFAN;MARK, ANDREAS;POPPELLER, MARKUS;KUHN, HANSJOERG;BORRELLO, DANIEL;BENAGLI, STEFANO;MEIER, JOHANNES;KROLL, ULRICH;VALLAT-SAUVAIN, EVELYNE |