| 摘要 |
<P>PROBLEM TO BE SOLVED: To create a waveform library from few items of information and attain high measurement resolution on the basis of even a small waveform library. <P>SOLUTION: Process parameters are changed and cross-sectional shape of a pattern is simulated and predicted. A spectral waveform is computed by simulation, by being associated with a predicted cross-sectional shape and being related to each process parameter to form a waveform library. Through the use of process parameters set, in such a way as to acquire a desired shape by making reference to the waveform library, optimal process parameters, corresponding to an actually acquired spectral waveform, are computed on the basis of an actually created pattern to be measured and an optimal pattern cross-sectional shape corresponding to acquired optimal process parameters and perform measurements is carried out. <P>COPYRIGHT: (C)2010,JPO&INPIT |
